Deposition and growth : limits for microelectronics, Anaheim, CA, 1987 / editor, G.W. Rubloff.
Contributor(s): Rubloff, G. W | American Institute of Physics.
Material type:
BookSeries: American Vacuum Society series ; 4. AIP conference proceedings: no. 167.Publisher: New York : American Institute of Physics, 1988Description: 388 p. : ill.ISBN: 0883183676.Subject(s): Thin films | Microelectronics -- Materials
| Item type | Current location | Home library | Collection | Shelving location | Call number | Status | Date due | Barcode |
|---|---|---|---|---|---|---|---|---|
Books
|
Matheson Library | Matheson Library | Main Collection | Main Collection | 621.381 D422 (Browse shelf) | Available | 072417 |
Browsing Matheson Library Shelves , Shelving location: Main Collection , Collection code: Main Collection Close shelf browser
| No cover image available | No cover image available | No cover image available |
|
No cover image available |
|
No cover image available | ||
| 621.381 C851 Principles of electronic technology / | 621.381 C851 Principles of electronic technology / | 621.381 D281 A laboratory manual of electronics / | 621.381 D422 Deposition and growth : | 621.381 D812 Electronics assembly methods / | 621.381 D812g A guide to advanced manufacturing in electronics / | 621.381 D913 Electronics and nuclear physics / |
There are no comments for this item.