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Concepts of fit an individualized approach to pattern design Bonnita M. Farmer, Lois M. Gotwals

By: Farmer, Bonnita M.
Contributor(s): Gotwals, Lois M.
Material type: materialTypeLabelBookPublisher: New York London Macmillan Collier Macmillan c1982Description: ix, 229 p. ill 29 cm.Subject(s): Dressmaking -- Pattern design | Tailoring -- Pattern designDDC classification: 646.4
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Main Collection Main Collection 646.4072 F233c (Browse shelf) Available 045913
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646.404 R382 Sewing for fashion design / 646.404 R382 Sewing for fashion design / 646.404 V888 Vogue sewing. 646.4072 F233c Concepts of fit 646.4204 T583c The custom look 646.4304 M133h How to make sewing patterns 646.4304 T583c The custom look

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